| Инд. авторы: | Grigoryev Yu.N., Gorobchuk A.G. |
| Заглавие: | Physical-Chemical Hydrodynamics and Optimization of Plasma-Chemical Reactors for Silicon Etching |
| Библ. ссылка: | Grigoryev Yu.N., Gorobchuk A.G. Physical-Chemical Hydrodynamics and Optimization of Plasma-Chemical Reactors for Silicon Etching // Proc. XII Int. Conf. on Methods Aerophys. Research (ICMAR). Pt II. Novosibirsk, Russia, 2004. - P.83-88. |
| Издано: | Novosibirsk, Russia: , 2004 |
| Физ. характеристика: | с.83-88 |